Link #1 :
https://doi.org/10.1364/OPTICA.406304
, Hit:
60119
:
Minsu Kang, Changhyun Han and Heonsu Jeon
:
Optica 7(12), 1788-1795 (2020)
Maskless photolithography based on the digital micromirror device (DMD), a two-dimensional micromirror
array, is considered the next-generation low-cost lithographic technology. However, the DMD-based digital
photolithography has been implemented only for micrometre-scale pattern generation, whereas sophisticated
photonic devices require the feature sizes of approximately 100 nm. In this study, a high-magnification
objective lens (200¡¿) is adopted for a custom-built digital photolithography system to generate submicron-
scale patterns. Techniques augmenting the digital photolithography, pattern tilting and greyscale exposure,
are also improvised. Photonic crystal band-edge lasers of various lattice structures and periods are
demonstrated as quality-assessment testbeds. |
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